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椭球形微波等离子体金刚石膜沉积装置与金刚石膜的制备 被引量：3

Ellipsoidal microwave plasma CVD reactor for diamond films deposition and preparation of diamond films
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摘要 对椭球形谐振腔式微波等离子体(MPCVD)金刚石膜沉积装置的谐振腔进行了模拟,获得了谐振腔中的电场和等离子体分布。运用自行设计和建立的椭球形谐振腔式微波等离子体装置,沉积了纳米和微米尺度的金刚石膜。对金刚石膜的各种性能进行了检测。结果表明,所建成的椭球形谐振腔式的MPCVD金刚石膜沉积装置,可实现微米和纳米尺度不同品质金刚石膜的沉积。 The distribution of electric field and plasma was obtained by simulating the resonance cavity of ellipsoidal microwave plasma CVD （MPCVD）. Nano-diamond films and micro-diamond films were deposited by the self-designed and set up ellipsoidal MPCVD system. The properties of diamond films were tested. The results show that both micro-diamond films and nano-diamond films with different quality can be deposited in the ellipsoidal reactor.
作者 王凤英 唐伟忠 姜春生 于盛旺
机构地区 北京科技大学材料科学与工程学院
出处 《金属热处理》 CAS CSCD 北大核心 2009年第9期20-24,共5页 Heat Treatment of Metals
基金 国家自然科学基金(10675017)
关键词 金刚石膜 数值模拟 椭球形谐振腔 微波等离子体 diamond film numerical simulation elfipsoidal cavity microwave plasma
分类号 TB43 [一般工业技术]
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参考文献14

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二级参考文献46

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共引文献23

同被引文献16

  • 1高陇桥.金刚石膜在真空电子器件输出窗中的应用[J].真空电子技术,2006,19(4):4-5. 被引量：7
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引证文献3

二级引证文献17

金属热处理
2009年 第9期

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