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氧气的相对流量对磁控溅射制备TiO_2薄膜性质的影响

Effect of Relative Flow Rate of O_2 on Properties of TiO_2 Film Prepared by the Magnetron Sputtering
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摘要 本文研究了氧气相对流量对蓝宝石衬底上用磁控溅射制备TiO2薄膜性质的影响,并采用XRD、XPS、AFM等检测手段对其进行了结构、成分、表面形貌和透过率表征。结果表明,氧气的相对流量的变化对TiO2薄膜的物相、表面形貌和近红外透过率有显著影响,对TiO2薄膜中Ti2p3/2的结合能影响不大。 In this paper, the effect of relative flow of oxygen on properties of TiO2 films by magnetron sputtering was investigated. The structure, composition, surface morphologies and transmittance of films were characterized with XRD, XPS and AFM et al. The results show that the variation of oxygen relative flow rate has notable effect on structure, surface morphologies and near infrared transmittance of TiO2 films, and has moderate effect on Ti2p^3/2 binding energy of TiO2 films.
机构地区 哈尔滨工业大学
出处 《硅酸盐通报》 CAS CSCD 北大核心 2009年第B08期33-36,共4页 Bulletin of the Chinese Ceramic Society
关键词 TIO2薄膜 磁控溅射 蓝宝石 TiO2 film magnetron sputtering sapphire
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