摘要
用离子束辅助沉积技术(IonBeamAssistedDeposition,IBAD)制成CNx/NbN纳米多层膜.研究了工艺参数(轰击能量,基片温度)对股的结构和性能的影响,分析表明,多层膜内的NbN为多晶结构.在轰击能量为400eV,基片温度为600℃时,得到了与β—C3N的晶面间距相对应的三条电子衍射环.基片温度的上升,膜层的硬度上升;轰击能量增大.炒股层的硬度表现为先上升后下降,最大显微硬度达41.81GPa.
Nano-scale multilayers of CNx/NbN have been prepared by ion beam sputtering deposition. The effects of such deposition parameters as substrate temperature, bombarding energy individual layer thickness, etc, were studied. TEM and X-ray analysis confirmed that the NbN layerswere polycrystalline. Diffraction rings from CNx layers were in good agreement with those of β-C3N4.With the increase of the substrate temperature, the hardness of the layers increases. When we increasethe bombardment energy, the hardness of the multilayers increases initially then decreases. A maximumof hardness of 41.81GPa was obtained.
出处
《材料研究学报》
EI
CAS
CSCD
北大核心
1998年第5期543-545,共3页
Chinese Journal of Materials Research