摘要
研究了一种用于并行激光直写的连续深浮雕衍射透镜阵列方法.该方法采用连续浮雕衍射透镜阵列替换传统并行激光直写中的物镜阵列,在兼顾系统分辨力基础上,克服了波带片等衍射透镜阵列衍射效率低的缺点;同时因采用深浮雕结构优化环带宽度,可降低阵列的制作难度.针对并行激光直写系统阵列F/#小的特点,在建立连续深浮雕衍射透镜阵列非旁轴近似聚焦模型基础上,设计、制作和测试了波长为441.6nm,F/#为7.5的连续深浮雕衍射透镜阵阵列.测试结果表明:该阵列的衍射效率优于70%,远高于波带片阵列的40%.
Diffractive optical elements （DOEs） arrays with continuous deep-relief for maskless lithography is investigated.In comparison with such conventional DOEs arrays as zone-plates array used for maskless lithography,the DOEs with continuous deep-relief make it possible to further increase NA at a high diffraction focusing efficiency,and deep relief can be used to optimize relief depth and zone period to make the fabrication of arrays easy.To verify its validity,continuous-deep-relief DOEs arrays with F/7.5 are designed,fabricated and characterized for maskless lithography.Experimental results indicate that a diffraction efficiency of over 70% can be achieved at normal incidence and writing laser wavelength of 441.6 nm,which is much higher than the diffraction efficiency of 40% for a zone-plates array.
出处
《光子学报》
EI
CAS
CSCD
北大核心
2009年第11期2880-2884,共5页
Acta Photonica Sinica
基金
国家自然科学基金(60908026
60878028)
黑龙江省博士后资助经费(LBH-Z08214)
哈尔滨市科技创新人才研究专项资金(2008RFQXG024)资助
关键词
并行激光直写
连续浮雕衍射透镜
深浮雕
衍射效率
Maskless lithography
Diffractive optical elements with continuous relief
Deep relief
Diffraction efficiency
