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CVD金刚石膜的热化学抛光技术 被引量:5

Thermochemical Polishing Techniques of CVD Diamond Films
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摘要 金刚石膜的抛光技术目前已成为影响金刚石膜推广应用的关键技术之一。近年来开发的各种金刚石膜抛光技术都有其各自的优缺点和局限性。基于碳原子扩散的金刚石膜热化学抛光技术因抛光质量好、效率较高、机械损伤小等优点,而具有发展前景。但目前开发的将抛光盘整体加热至高温的热化学抛光方法,存在设备运行复杂、抛光加工成本高等问题。本文综合论述了金刚石膜热化学抛光技术的发展、特点及不同因素对金刚石膜热化学抛光的影响,在此基础上提出了一种稀土金属辅助作用下的金刚石膜超高速抛光新方法。运用扩散理论分析了抛光温度对金刚石膜理论去除率的影响,所得结果与实验较符合。本文提出的超高速抛光方法具有设备简单、可用于金刚石膜的精密抛光等优点。 The polishing technology of diamond films has become one of the key technologies for the popularization and application of diamond films. In recent years, a number of alternative polishing techniques of diamond films have been reported, and each having technological advantages and disadvantages. The thermochemical polishing technology based on the diffusion of carbon atoms has good prospect due to its superior properties, e.g. excellent polishing quality, high efficiency and very small mechanical damage. But up to now, the thermochemiaeal polishing method, in which the polishing plate is heated to high temperature, either need complicated apparatus or the polishing process is very costly. In this paper, the development and characteristics of thermochemical polishing techniques were reviewed, and the effects of different factors on thermochemical polishing of diamond films were also reviewed. Finally, a new super-high speed polishing method of diamond films has been proposed, which was aided by the rare earth metal. The effects of polishing temperature on the theoretical removal rate of diamond films has been analyzed by using diffusion mechanics, and the results agree well with the experiment data. The super-high speed polishing method has the advantages of simple apparatus and precision polishing for diamond films, etc.
出处 《人工晶体学报》 EI CAS CSCD 北大核心 2009年第6期1456-1462,共7页 Journal of Synthetic Crystals
基金 国家自然科学基金(No.50675142)
关键词 金刚石膜 热化学抛光 扩散 超高速抛光 diamond films thermochemieal polishing diffusion super-high speed polishing
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  • 1Malshe A P, Park B S, Brown W D, et al. A Review of Techniques for Polishing and Planarizing Chemically Vapor-deposited (CVD) Diamond Films and Substrates [ J ]. Diamond and Related Materials, 1999,8 ( 7 ) : 1198-1213.
  • 2满卫东,汪建华,王传新,马志斌.金刚石薄膜的性质、制备及应用[J].新型炭材料,2002,17(1):62-70. 被引量:53
  • 3Tang C J, Neves A J, Femandes A J S, et al. A New Elegant Technique for Polishing CVD Diamond Films[J]. Diamond and Related Materials, 2003, 12(8): 1411-1416.
  • 4严朝辉,汪建华,满卫东,熊军.CVD金刚石厚膜的机械抛光研究[J].金刚石与磨料磨具工程,2007,27(3):32-35. 被引量:16
  • 5Wang C Y, Zhang F L, Kuang T C, et al. Chemical/Mechanical Polishing of Diamond Films Assisted by Molten Mixture of LiNO3 and KNO3 [J]. Thin Solid Films, 2006, 496(2) :698-702.
  • 6Yoshikawa M, Okuzumi F. Hot-iron-metal Polishing Machine for CVD Diamond Films and Characteristics of the Polished Surfaces [ J ]. SuoCace and Coating Technology, 1996,88 ( 1-3 ) :197-203.
  • 7Zaitsev A M, Kosaea G, Rieharz B, et al. Thermoehemical Polishing of CVD Diamond Films[ J]. Diamond and Related Materials, 1998,7 (8) : 1108-1117.
  • 8刘敬明,蒋政,张恒大,吕反修,唐伟忠.大面积CVD金刚石膜的热铁板抛光[J].北京科技大学学报,2001,23(1):42-44. 被引量:8
  • 9Hirata A, Tokura H, Yoshikawa M. Smoothing of Chemically Vapour Deposited Films by Ion Beam Irradiation[ J]. Thin Solid Films, 1992, 212 ( 1-2 ) :43-48.
  • 10Ozkan A M, Malshe A P, Brown W D. Sequential Multiple-laser-assisted Polishing of Free-standing CVD Diamond Substrates[J].Diamond and Related Materials, 1997, 6( 12 ) : 1789-1798.

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