摘要
本文采用射频磁控溅射法在硬质合金钻头表面制备了TiAlN薄膜。XPS测试表明,膜层的主要成分为金属氮化物,Ti/Al原子个数比约为1∶1;XRD分析表明膜层中只出现Ti3AlN的衍射峰,并且在(220)上有明显的择优取向;SEM测试表明所制备的薄膜连续、光滑、组织致密;硬度测试显示薄膜硬度HV最高达到2465;膜/基界面的结合力经测定为42.12N。
In this study, TiAlN thin fdms were deposited on cemented carbide substrates by reactive RF magnetron sputtering. XPS observations revealed that films were mainly composed of metal nitrides and an atomic Ti/Al ratio in the films of approximately 1： 1; XRD results show the deposited films demonstrate a c-axis preferred orientation of （220） with Ti3AlN peak; SEM investigations revealed that the films have low droplet density and very smooth surface;The hardness could reach 2465 （HV）, and the adhesion between the films and the base is 42.12N.
出处
《硬质合金》
CAS
北大核心
2009年第4期218-222,共5页
Cemented Carbides
关键词
TIALN薄膜
磁控溅射
组织结构
性能
TiAIN thin flims,magnetron sputtering,phase structure,properties
