摘要
采用电子束蒸发方法在LiB3O5(LBO)晶体上制备了无缓冲层和具有不同缓冲层的1064nm,532nm倍频增透膜。利用Lambda900分光光度计、MTS Nano Indenter纳米力学综合测试系统以及调Q脉冲激光装置对样品的光学性能、附着力和激光损伤阈值进行了测试分析。结果表明,所有样品在1064nm和532nm波长的剩余反射率都分别小于0.1%和0.2%。与无缓冲层样品相比,预镀Al2O3缓冲层的样品的附着力提高了43%,具有Si O2缓冲层的样品的附着力显著提高。激光损伤阈值分析表明,采用Si O2缓冲层改进了薄膜的抗激光损伤性能,但是Al2O3缓冲层的插入却导致薄膜的激光损伤阈值降低。
1064 nm,532 nm frequency-doubled antireflection coating with out buffer layer or with different buffer layers were fabricated by using electron beam evaporation technique on LBO.The optical property,adhesion and laser-induced damage threshold（LIDT） were investigated by Lambda900 spectrometer,MTS nano Indenter and Q-switched pulsed laser,respectively.The results showed that the reflectance of all samples was below 0.1% and 0.2% at wavelength of 1064 nm and 532 nm,respectively.Comparing with the sample without buffer layer,the critical adhesion of the sample with buffer layer of Al2O3 was increased by 43% and that of the coating with buffer layer of SiO2 was improved significantly.LIDT of the coatings were improved by using buffer layer of SiO2 and that of the coating with buffer layer of Al2O3 was decreased.
出处
《光学学报》
EI
CAS
CSCD
北大核心
2010年第1期272-276,共5页
Acta Optica Sinica
基金
辽宁省教育厅科研项目计划(2008224)
辽宁省科技厅科研项目计划(20081030)
沈阳市科技局项目(1071115-1-00)资助课题
关键词
薄膜光学
倍频增透膜
LBO晶体
附着力
激光损伤阈值
缓冲层
thin film optics frequency-doubled antireflection coating LBO crystal adhesion laser-induced damage threshold buffer layer
