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倾斜沉积“雕塑”薄膜结构参数优化分析 被引量:2

Determination of Structural Parameters for Obliquely Deposited Sculptured Thin Film
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摘要 基于双轴双折射薄膜模型,利用在不同入射角度下薄膜对两种偏振态光波透射光谱,同时获得"雕塑"薄膜主轴折射率N1,N2,N3和薄膜厚度d及柱状角β等参数。基于倾斜沉积技术,利用电子束反应蒸发方法制备了氧化钽"雕塑"薄膜。借助于模拟退火算法,对入射角度为0,20°,30°,45°和60°时两种偏振态光波的透射光谱进行拟合,确定了氧化钽"雕塑"薄膜的结构参数,并与场发射扫描电镜测量的薄膜结构进行了比较。结果表明,利用透射光谱曲线可以较为准确地获得"雕塑"薄膜的结构参数。 Based on the biaxial birefringent model,the structural parameters of thin film,including the principal refractive indices N1,N2,N3,the thickness d and the column angle β were determined by fitting the measured transmittance spectra for two polarizations at the normal and oblique incidence.With the glancing angle deposited technique,the sculptured tantalum oxide thin films were deposited by reactive electron beam evaporation.The structural parameters were extracted by fitting the measured spectral transmittance curves at the incident angle of 0,20°,30°,45° and 60° with the simulated annealing algorithm.Besides,the tilted nano-column structure,the thickness and the column angle were obtained with the cross section of thin film,examined with scanning electron microscope.The results show that the structure parameters of sculptured thin film can be extracted from the transmittance spectra.
出处 《光学学报》 EI CAS CSCD 北大核心 2010年第1期287-293,共7页 Acta Optica Sinica
基金 国家自然科学基金(60778026) 上海科技启明星基金(07QB14006)资助课题
关键词 薄膜 结构参数提取 倾斜沉积技术 模拟退火算法 “雕塑”薄膜 thin film exeraction of structural parameters glancing-angle deposited technique simulated annealing algorithm sculptured thin film
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