摘要
利用石英钟罩式微波等离子体化学气相沉积（ＭＷ－ＰＣＶＤ）实验装置研究了不同沉积气压对金刚石薄膜沉积结果的影响。扫描电子显微镜（ＳＥＭ）显微形貌观察及喇曼光谱（ＲＡＭＡＮ）分析表明沉积气压的提高有利于改善ＭＷ－ＰＣＶＤ制备金刚石薄膜的质量。
The diamond films were deposited in a quartz bell jar type microwave plasma chemical vapour deposition (MW—PCVD) research device. The influence of different deposition pressures on diamond film were characterized by scanning electron microscopy (SEM) and Raman spectroscopy. From the results it was found that increasment of deposition pressure was benefical to improving the quality of diamond films.
出处
《真空与低温》
1998年第1期26-29,共4页
Vacuum and Cryogenics
关键词
微波等离子体
化学气相沉积
金刚石
薄膜
Microwave plasma chemical vapour deposition, Diamond film, Deposition pressure.
