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Two-dimensional particle-in-cell plasma source ion implantation of a prolate spheroid target

Two-dimensional particle-in-cell plasma source ion implantation of a prolate spheroid target
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摘要 A two-dimensional particle-in-cell simulation is used to study the time-dependent evolution of the sheath surrounding a prolate spheroid target during a high voltage pulse in plasma source ion implantation. Our study shows that the potential contour lines pack more closely in the plasma sheath near the vertex of the major axis, i.e. where a thinner sheath is formed, and a non-uniform total ion dose distribution is incident along the surface of the prolate spheroid target due to the focusing of ions by the potential structure. Ion focusing takes place not only at the vertex of the major axis, where dense potential contour lines exist, but also at the vertex of the minor axis, where sparse contour lines exist. This results in two peaks of the received ion dose, locating at the vertices of the major and minor axes of the prolate spheroid target, and an ion dose valley, staying always between the vertices, rather than at the vertex of the minor axis. A two-dimensional particle-in-cell simulation is used to study the time-dependent evolution of the sheath surrounding a prolate spheroid target during a high voltage pulse in plasma source ion implantation. Our study shows that the potential contour lines pack more closely in the plasma sheath near the vertex of the major axis, i.e. where a thinner sheath is formed, and a non-uniform total ion dose distribution is incident along the surface of the prolate spheroid target due to the focusing of ions by the potential structure. Ion focusing takes place not only at the vertex of the major axis, where dense potential contour lines exist, but also at the vertex of the minor axis, where sparse contour lines exist. This results in two peaks of the received ion dose, locating at the vertices of the major and minor axes of the prolate spheroid target, and an ion dose valley, staying always between the vertices, rather than at the vertex of the minor axis.
出处 《Chinese Physics B》 SCIE EI CAS CSCD 2010年第3期363-366,共4页 中国物理B(英文版)
基金 Project supported by the Program for Innovative Research Team of High Education in Liaoning Province,China (Grant No.2009T055)
关键词 plasma source ion implantation ion sheath two-dimensional particle-in-cell model Iondose plasma source ion implantation, ion sheath, two-dimensional particle-in-cell model, Iondose
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  • 1Conrad J R, Radtke J L, Dodd R A, Worzala F J and Tran N C 1987 J. Appl. Phys. 62 4591.
  • 2Scheridan T E and Alport M J 1994 Appl. Phys. Lett. 64 1783.
  • 3Mantese J V, Brown I G, Cheung N W and Collins G A 1996 MRS Bull. 21 52.
  • 4Chu P K, Qin S, Chan C, Cheung N W and Larson L A 1996 Mater. Sci. Eno. R 17 207.
  • 5Kwok D T K, Chu P K and Chan C 1998 IEEE Trans. Plasma Sci. 26 1669.
  • 6Tian X B, Fu R K Y, Chu P K and Yang S Q 2005 Surf. Coatings Technol. 196 162.
  • 7Shao J, Jones E C and Cheung N W 1997 Surf. Coat. Technol. 93 254.
  • 8Ayers R A, Simske S J, Bateman T A, Petkus A, Sachdeva R L C and Gyunter V E 1999 J. Biomed. Mater. Res. 45 42.
  • 9Ikeda D, Ogawa M, Hara Y, Nishimura Y, Odusanya O, Azuma K, Matsuda S, Yatsuzuka M and Murakami A 2002 Surf. Coat. Technol. 156 301.
  • 10Chu P K, Chen J Y, Wang L P and Huang N 2002 Mater. Sci. Eng.: Rep. 36 143.

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