期刊文献+

Influence of Ga^+ ion irradiation on the magnetisation reversal process and magnetoresistance in CoFe/Cu/CoFe/IrMn spin valves

Influence of Ga^+ ion irradiation on the magnetisation reversal process and magnetoresistance in CoFe/Cu/CoFe/IrMn spin valves
原文传递
导出
摘要 Ga^+ ion irradiation is performed on the surfaces of IrMn-based spin valves and the effects of ion irradiation on the magnetisation reversal process and magnetoresistance (MR) are investigated. The results show that the exchange bias field and magnetoresistance ratio of the spin valve decrease with the increase of ion dose. The width of the forward step between the free layer and the pinned layer becomes gradually smaller with the increase of ion dose whilst the recoil step tends to be narrower with ion dose increasing up to 6×10^13 ions/cm^2 and the step disappears afterwards. Two oeaks in the R-H curve are found to be asymmetric. Ga^+ ion irradiation is performed on the surfaces of IrMn-based spin valves and the effects of ion irradiation on the magnetisation reversal process and magnetoresistance (MR) are investigated. The results show that the exchange bias field and magnetoresistance ratio of the spin valve decrease with the increase of ion dose. The width of the forward step between the free layer and the pinned layer becomes gradually smaller with the increase of ion dose whilst the recoil step tends to be narrower with ion dose increasing up to 6×10^13 ions/cm^2 and the step disappears afterwards. Two oeaks in the R-H curve are found to be asymmetric.
出处 《Chinese Physics B》 SCIE EI CAS CSCD 2010年第3期533-538,共6页 中国物理B(英文版)
基金 Project supported by the National Natural Science Foundation of China (Grant No. 50671048)
关键词 ion irradiation magnetisation reversal MAGNETORESISTANCE exchange bias ion irradiation, magnetisation reversal, magnetoresistance, exchange bias
  • 相关文献

参考文献26

  • 1Blomeier S, McGrouther D, O'Neill R, McVitie S, Chapman J N, Weber M C, Hillebrands B and Fassbender J 2005 J. Magn. Magn. Mater. 290-291 731.
  • 2Fassbender J and McCord J 2008 J. Magn. Magn. Mater. 320 579.
  • 3Zhang K, Gupta R, Muller G A, Schaaf P and Lieb K P 2004 Appl. Phys. Lett. 84 3915.
  • 4McGrouther D, Chapman J N and Vanhelmont F W M 2004 J. Appl. Phys. 95 7772.
  • 5Xu D Q, Zhang Y M, Zhang Y M, Li P X, Wang C, Lu H L, Tang X Y and Wang Y H 2008 Chin. Phys. B 17 4648.
  • 6Chang G S, Moewes A, Kim S H, Lee J, Jeong K, Whang C N, Kim D H and Shin S C 2006 Appl. Phys. Lett. 88 092504.
  • 7Beta S, Roy S, Bhattacharjee K, Kun G and Dev B N 2007 J. Appl. Phys. 102 014308.
  • 8Fu W J, Liu Z W, Liu M, Mu Z X, Zhang Q Y, Guan Q F and Chen K M 2009 Acta Phys. Sin. 58 5693.
  • 9Xue S W, Zu X T, Su H Q, Zheng W G, Xiang X, Deng H and Yang C R 2007 Chin. Phys. 16 1119.
  • 10Kerr E, Dijken S van, Langford R M and Coey J M D 2005 J. Magn. Magn. Mater. 290-291 124.

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部