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Fast statistical delay evaluation of RC interconnect in the presence of process variations

Fast statistical delay evaluation of RC interconnect in the presence of process variations
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摘要 Fast statistical methods of interconnect delay and slew in the presence of process fluctuations are proposed. Using an optimized quadratic model to describe the effects of process variations, the proposed method enables closedform expressions of interconnect delay and slew for the given variations in relevant process parameters. Simulation results show that the method, which has a statistical characteristic similar to traditional methodology, is more efficient compared to HSPICE-based Monte Carlo simulations and traditional methodology. Fast statistical methods of interconnect delay and slew in the presence of process fluctuations are proposed. Using an optimized quadratic model to describe the effects of process variations, the proposed method enables closedform expressions of interconnect delay and slew for the given variations in relevant process parameters. Simulation results show that the method, which has a statistical characteristic similar to traditional methodology, is more efficient compared to HSPICE-based Monte Carlo simulations and traditional methodology.
作者 李建伟 董刚 杨银堂 王增
机构地区 Key Laboratory of Ministry of Education for Wide Band-Gap Semiconductor Materials and Devices
出处 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2010年第4期104-108,共5页 半导体学报（英文版）
关键词 process variations RC delay static delay process variations RC delay static delay
分类号 TU528 [建筑科学—建筑技术科学]
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参考文献11

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Journal of Semiconductors
2010年 第4期

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