期刊文献+

Three-Dimensional Modeling of Argon Discharge Characteristics of a Large-Scale Rectangular Surface-Wave Plasma Source 被引量:1

Three-Dimensional Modeling of Argon Discharge Characteristics of a Large-Scale Rectangular Surface-Wave Plasma Source
下载PDF
导出
摘要 A three-dimensional fluid model for surface-wave plasma (SWP), to investigate the discharge characteristics of a rectangular SWP source working in a steady state, was presented. The simulation is performed for different gas pressures in argon and different deposited powers. The results showed that there is a peak of plasma density at a distance of 2 cm to 3 cm from the plasma-quartz interface whose position depends mainly on the gas pressure but not the deposited power. The spatial distributions of plasma parameters and their dependence on the gas pressure and deposited power are also presented and discussed. Using this model a good agreement between the simulation results and the available experimental data is obtained. A three-dimensional fluid model for surface-wave plasma (SWP), to investigate the discharge characteristics of a rectangular SWP source working in a steady state, was presented. The simulation is performed for different gas pressures in argon and different deposited powers. The results showed that there is a peak of plasma density at a distance of 2 cm to 3 cm from the plasma-quartz interface whose position depends mainly on the gas pressure but not the deposited power. The spatial distributions of plasma parameters and their dependence on the gas pressure and deposited power are also presented and discussed. Using this model a good agreement between the simulation results and the available experimental data is obtained.
出处 《Plasma Science and Technology》 SCIE EI CAS CSCD 2010年第2期129-133,共5页 等离子体科学和技术(英文版)
关键词 surface wave plasma electron density distribution electron temperature distribution surface wave plasma, electron density distribution, electron temperature distribution
  • 相关文献

参考文献14

  • 1Ghanashev I, Sugai H. 2000, Phys. Plasmas, 7:3051.
  • 2Ganashev I, Nagatsu M, Sugai H. 1997, Jpn. J. Appl. Phys., 36:337.
  • 3Sugai H, Ghanashev I, Nagatsu M. 1998, Plasma Sources Sci. Technol., 7:192.
  • 4Kousaka H, Ono K. 2002, Jpn. J. Appl. Phys., 41:2199.
  • 5Chen Q, Aoyagi H P, Katsurai M. 1999, IEEE Trans. Plasma Sci., 27:164.
  • 6Tatarova E, Dias F M, Ferreira C M. 1998, J. Appl. Phys., 83:4602.
  • 7Tatarova E, Dias F M, Henriques J, et al. 2005, IEEE Trans. Plasma Sci., 33:866.
  • 8Chen Zhaoquan, Zhou Peiqing, Chen Wei, et al. 2008, Plasma Sci. and Technol., 10:655.
  • 9Lan Chaohui, Chen Zhaoquan, Liu Minghai, et al. 2009, Plasma Sci. and Technol., 11:66.
  • 10Ashida S, Lee C, Lieberman M A. 1995, J. Vac. Sci. Technol. A, 13:2498.

引证文献1

二级引证文献2

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部