摘要
用X射线衍射仪(XRD)、扫描电子显微镜(SEM)和紫外-可见分光光度计观察4%(原子分数)In掺杂ZnO薄膜的微结构、表面形貌和光学性质。微结构分析表明:薄膜仍为六角纤锌矿结构,由于In杂质的掺入,使得薄膜结晶度劣化,退火温度对薄膜微结构影响较小;表面形貌观察结果显示:薄膜表面凹凸不平,450℃退火处理薄膜表面最平坦,尺寸在50～100nm之间小颗粒致密、均匀地分布于起伏的表面;紫外可见透射谱研究结果表明:随着退火温度升高,薄膜光学带宽Eg由3.267eV减小到3.197eV,该结果可能与薄膜表面残余应力发生变化密切相关。
Microstructure,surface morphology and optical properties of ZnO thin film with 4at.% In doping concentration were measured by X-ray diffractometer,scanning electron microscope and UV-Vis spectrophotometer. Microstructure analysis shows that all films are polycrystalline and exhibit the hexagonal wurtzite structure. The crystallinity is deteriorated due to doping with indium. Intensity of the diffraction peaks almost has no change with annealing temperature increases. Surface morphology results indicate that the films are irregular,and possess the particle size of 50-100 nm having uniform and dense microstructure. Optical transmittance spectra show that as annealing temperature increases,the value of optical bandgap decreases from 3.267 to 3.197 eV,which might be induced by the transition of residual stress.
出处
《硅酸盐通报》
CAS
CSCD
北大核心
2010年第1期214-218,共5页
Bulletin of the Chinese Ceramic Society
基金
安徽省重点科研计划项目(07020203009)
安徽省高等学校省级自然科学研究项目(KJ2007B135)
关键词
ZNO薄膜
退火温度
光学性质
ZnO thin film
annealing temperature
optical properties
