摘要
本文利用原子力显微镜对具有不同厚度Ｎｉ过渡层的Ｃｏ５．０ｎｍ／Ｃｕ３．５ｎｍ／Ｃｏ５．０ｎｍ三明治在各个制备阶段样品的表面形貌进行了系统的研究，并结合Ｘ射线衍射的结果，发现Ｎｉ过渡层可以使Ｃｏ／Ｃｕ／Ｃｏ三明治的界面平整，并形成强的（１１１）织构，从而导致材料的巨磁电阻值增大和矫顽力减少。
Micro structure and giant magnetoresistance were investigated for Co 5 0nm/Cu 3 5nm/Cu 5 0nm sandwiches with different thickness of Ni buffer layers at different fabrication steps by atomic force microscope. The topographies of the sandwiches with Ni buffer layer showed that the interfaces of the Co/Cu/Co sandwiches were flattened significantly. The X ray diffraction results indicated that strong (111) texture is formed in Ni buffered Co/Cu/Co sandwiches. All these improvements of the structure enhanced the magnetoresistance and reduced partly the coercivity. In addition, the decrease of the MR ratio was found to be resulted from the current shunting in the over thick Ni buffer layer by resistivity analysis.
出处
《电子显微学报》
CAS
CSCD
1999年第1期29-34,共6页
Journal of Chinese Electron Microscopy Society
关键词
微结构
巨磁电阻
AFM
过渡层
钴/铜/钴
层状模
micro structure
atomic force microscope
giant magnetoresistance effect
buffer layer
