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氨气氮化Ga_2O_3粉体合成GaN的生长机制研究 被引量:1

Investigation on Growth Mechanism of GaN Synthesized by Ammoniating Ga_2O_3 Powders
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摘要 以Ga2O3为主要原料,通过氨气氮化反应合成了单相GaN粉体。利用X射线衍射(XRD)、扫瞄电镜(SEM)和荧光光谱(PL)分析在900~1050℃范围内,氮化温度和时间对产物的影响。结果表明:氮化温度在920℃以上时能够生成纯度较高的六方铅锌矿型GaN粉体,反应温度达性能优异。反应产物初始的平板和柱状结构显示了系统反应开始为气-固机制(V-S),但随时间的延长转变为到1000℃时,合成的粉体具有良好的结晶性能;当反应温度为1000℃,氮化时间为1.5h时,所得样品发光以分解-重结晶为主导的合成机制,该机制使得粉体颗粒细化,并随着反应温度的提高以及氮化时间的延长,细化效果更加明显。 Single phase gallium nitride (GaN) powders were produced by ammoniating reactions using Ga2O3 powders as raw material.The effect of reaction temperature and time on the properties of as-synthesized GaN between 900 ℃ and 1050 ℃ was analyzed by X-ray diffraction (XRD),scanning electron microscopy (SEM) and photoluminescence (PL) measurement,respectively.The results show that the hexagonal wurtzite GaN powders appear above 920 ℃.The samples fabricated at 1000 ℃ have quite well crystallization,and the samples ammoniated for 1.5 h at this temperature have quite well luminescent properties.Besides,the sheet-like and columnar grains suggest that the growth of GaN crystals are attributed to the V-S mechanism at first stage,and with the ammoniating time prolonged,it is transformed to a decomposition-re-crystallization process,which make the GaN powders thinner.The effect are significant with further increasing of reaction temperature and time.
出处 《人工晶体学报》 EI CAS CSCD 北大核心 2010年第3期638-643,共6页 Journal of Synthetic Crystals
基金 国家自然科学基金(No.50802057) 陕西科技大学科研启动基金
关键词 GAN 热分解 重结晶 GaN thermal decomposition re-crystallization
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  • 1张佳文,高鸿楷,张济康,杨永.MOCVD过程中回流现象的数值模拟[J].Journal of Semiconductors,1994,15(4):268-272. 被引量:5
  • 2陆大成,汪度,王晓晖,董建荣,刘祥林,高维滨,李成基,李蕴言.GaN的MOCVD生长[J].Journal of Semiconductors,1995,16(11):831-834. 被引量:9
  • 3金希卓,傅妹莉,徐世英.底部倾斜冷热壁直管内自然对流数值研究[J].吉林大学自然科学学报,1996(2):18-22. 被引量:4
  • 4童玉珍,张国义,徐自亮,党小忠,王晶晶,金泗轩,王舒民,刘弘度.MOCVD生长GaN的喇曼散射谱[J].红外与毫米波学报,1996,15(1):6-10. 被引量:1
  • 5LiangChunguang(梁春广) ZhangJi(张冀).GaN—Dawn of 3 rd—Generation semicondutor[J].Chinese Journal of Semicond- uctor(半导体学报),1999,20(2):89-89.
  • 6Lee S H,Nahm K S,Suh E K et al.Characterization of Mg-Doped GaN Micro-Crystals Grown by Direct Reaction of Gallium and Ammonia[J].Phys Stat Sol,2001,(b) 228(2):371~373
  • 7Jae-Ryoung Kim,Hwangyou Oh,Hye Mi So et al.Schottky Diodes Based on a Single GaN Nanowire[J].Institute of Physics Publishing Nanotecnology,2002,13:701~704
  • 8Zhang J,Peng X S,Wang X F et al.Micro-Raman Investigation of GaN Nanowires Prepared by Direct Reaction Ga with NH3[J].Chemical physics Letters,2001,345:372~376
  • 9Shi W S,Zhang Y F,Wang N et al.Microstructures of Gallium Nitride Nanowires Synthesized by Oxide-Assisted Method[J].Chemical Physics Letters,2001,345:377~380
  • 10Millet P,Calka A,Williams J S et al.Formation of Gallium Nitride by a Novel Hot Mechanical Alloying Process[J].Appl Phys Lett,1993,63:2 505

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  • 1Liu L,Edgar J H.Substrates for Gallium Nitride Epitaxy[J].Materials Science and Engineering:R:Reports,2002,37(3):61-127.
  • 2Conway A M,Asbeck P M,Moon J S,et al.Accurate Thermal Analysis of GaN HFETs[J].Solid-State Electronics,2008,52(5):637-643.
  • 3Nishida T,Kobayashi N.Ten-Milliwatt Operation of an AlGaN-Based Light Emitting Diode Grown on GaN Substrate[J].Physica Status Solidi(a),2001,188(1):113-116.
  • 4Monemar B,Pozina G.Group III-nitride Based Hetero and Quantum Structures[J].Progress in Quantum Electronics,2000,24(6):239-290.
  • 5Asatsuma T,Nakajima H,Hashimoto S,et al.Properties of GaN-based Laser Diodes with a Buried-ridge Structure[J].Journal of Crystal Growth,2000,221(1-4):640-645.
  • 6Hu J,Bando Y,Liu Z,et al.Synthesis of Crystalline Silicon Tubular Nanostructures with ZnS Nanowires as Removable Templates[J].Angewandte Chemie International Edition,2004,43(1):63-66.
  • 7Goldberger J,He R,Zhang Y,et al.Single-crystal Gallium Nitride Nanotubes[J].Nature,2003,422(6932):599-602.
  • 8Xia Y,Yang P,Sun Y,et al.One-Dimensional Nanostructures:Synthesis,Characterization,and Applications[J].Advanced Materials,2003,15(5):353-389.
  • 9Zhang R Q,Lifshitz Y,Lee S T.Oxide-Assisted Growth of Semiconducting Nanowires[J].Advanced Materials,2003,15(7-8):635-640.
  • 10Chen X,Lee S J,Moskovits M.Modification of the Electronic Properties of GaN Nanowires by Mn Doping[J].Applied Physics Letters,2007,91(8):082109.

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