摘要
A home-made electron source assisted medium-frequency （MF） magnetron sputter- ing system was used to deposit thick CrN films on silicon and tungsten carbide substrates at various nitrogen flow rates with a fixed total pressure （0.3 Pa） and MF power （11.2 kW）. Result from scanning electron microscopy showed that the deposited CrN films have clear columnar struc- ture, and X-ray diffraction revealed a preferred orientation of CrN （200） for samples prepared at a rate of N2/（N2＋Ar） below 60%, whereas those prepared at higher N2/（N2＋Ar） rate are dom- inated by Cr2N. Deposition rates up to 12.5 μm/h were achieved and the hardness of the CrN coatings were in a range of 11 GPa to 18 GPa.
A home-made electron source assisted medium-frequency （MF） magnetron sputter- ing system was used to deposit thick CrN films on silicon and tungsten carbide substrates at various nitrogen flow rates with a fixed total pressure （0.3 Pa） and MF power （11.2 kW）. Result from scanning electron microscopy showed that the deposited CrN films have clear columnar struc- ture, and X-ray diffraction revealed a preferred orientation of CrN （200） for samples prepared at a rate of N2/（N2＋Ar） below 60%, whereas those prepared at higher N2/（N2＋Ar） rate are dom- inated by Cr2N. Deposition rates up to 12.5 μm/h were achieved and the hardness of the CrN coatings were in a range of 11 GPa to 18 GPa.
基金
supported by National Natural Science Foundation of China (No.10875090)
the Ministry of Industry and Information Technology of China (No.2009ZX04012-032)
