摘要
本文对氮化碳的结构及制备工艺如溅射、化学气相沉积、离子束辅助沉积、激光烧蚀等作了较为详细的总结与分析，对各种制备工艺条件下的氮化碳的性能包括力学、电学及光学性能进行了讨论，并对今后的发展趋势提出了自己的见解．
A detailed review was made on the structure of the carbon nitride together with its preparation process such as sputtering, chemical vapor deposition, ion assisted deposition and laser ablation.The resulting mechanical, electronic and optical properties were discussed, followed by the analysis for further studies.
出处
《无机材料学报》
SCIE
EI
CAS
CSCD
北大核心
1999年第3期343-351,共9页
Journal of Inorganic Materials
关键词
氮化碳
超硬膜
制备
工艺
性能
carbon nitride, superhard films, process, properties
