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9,9′-联蒽薄膜的AFM和XRD研究 被引量:1

Analysis of 9,9'-bianthracene thin films using atomic force microscopy and X-ray diffraction
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摘要 利用常规的真空蒸发技术,在热氧化硅片的衬底上制备了不同的衬底温度、蒸发温度和蒸发时间条件下的9,9′-联蒽有机薄膜。用原子力显微镜对制备的9,9′-联蒽薄膜形貌进行了观察,研究了9,9′-联蒽的生长模式,并讨论了其表面形貌及岛状晶核分布与生长条件之间的机理。同时,借助X射线衍射仪分析了薄膜的晶体结构。结果表明,在衬底温度为50℃、蒸发温度为180℃、蒸发时间为60s时能够获得具有良好晶体特性的均匀致密的多晶薄膜,其适合作有机场效应晶体管的有源层。 The 9,9'-bianthracene was deposited on SiO2 with dry oxidation by routine vacuum evaporation.The surface morphology of the thin films for 9,9'-bianthracene was investigated by AFM,which was prepared at different substrate temperatures,vapor temperatures and vapor times.The growing model of 9,9'-bianthracene was studied.The mechanism between surface morphology island distribution and growth condition was discussed.At the same,using the X-ray diffraction analyzed crystal structure. The thin film grown at 50℃ of substrate temperature,180℃ of vapor temperatures and 60s of vapor times has the excellent crystal performance.
出处 《功能材料》 EI CAS CSCD 北大核心 2010年第8期1379-1382,共4页 Journal of Functional Materials
基金 国家自然科学基金资助项目(60676033) 兰州交通大学"青蓝"人才工程基金资助项目(QL-08-18A)
关键词 9 9′-联蒽 表面形貌 生长模式 原子力显微镜 9 9'-bianthracene surface morphology growing model atomic force microscopy
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  • 1Tsumura A,Koezuka H,Ando T. [J]. Appl Phys Lett, 1986, 49(18): 1210-1212.
  • 2Horowitz G. [J]. Journal of Materials Research, 2004, 19(7) : 1946-1949.
  • 3Inoue Y, Tokito S, Ito K, et al. [J]. J Appl Phys, 2004, 95(10): 5795-5799.
  • 4Sheraw C D, Zhou L, Huang J R, et al. [J]. Appl Phys Lett, 2002, 80:1088-1090.
  • 5Klauk H, Halik M, Zschieschang U, et al. [J]. Journal of Applied Physics, 2002, 92 (9): 5259-5263.
  • 6Ho M H,Wu Y S,Wen S W, et al. [J] Appl Phys Lett, 2006,89(6) :252903-1-252903-3.
  • 7Okumoto K, Kanno K, Hamaa Y, et al. [J]. Appl Phys Lett, 2006,89(6) :063504-1-063504-3.

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  • 1Tsumura A, Koezuka H, Ando T. [J]. Appl Phys Lett, 1986,49:1210-1212.
  • 2Li J F,Chang W L,Ou G P,et al. [J]. Chin Phys Lett, 2008,25 : 4476-4479.
  • 3Yang S Y,Du W S,et al. [J]. Acta Physica Sinica,2009, 58:3427-3432.
  • 4Li J F,Chang W L,Ou G P,et al.[J]. Chin Phys B,2009, 18 : 3002-3006.
  • 5Yuan G C,Xu Z,Zhao S L,et al.[J]. Chin Phys B,2009, 18:3990-3994.

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