摘要
给出激光化学气相沉积法制备ａ－Ｓｉ３Ｎ４纳米粒子的原理和经验公式，在特定工艺参数下获得平均粒径为１０ｎｍ左右的优良ａ－Ｓｉ３Ｎ４纳米粒子。红外吸收和拉曼光谱研究表明，ａ－Ｓｉ３Ｎ４纳米粒子中存在Ｓｉ－Ｎ，Ｓｉ－Ｈ，Ｎ－Ｈ，Ｓｉ－Ｏ－Ｓｉ键，分析了ａ－Ｓｉ３Ｎ４纳米粒子在不同的温度和气氛退火后的变化情况。
In this paper,the principle and the empirical formulas of the preparation for nanometer sized a Si 3N 4 particles by laser induced chemical vapor deposition(LICVD) are given.Under certain technological parameters,the high quality nanometer a Si 3N 4 particles whose average diameter is about 10nm are obtained.The studies of IR and Raman show that there are Si-N ,Si-H,N-H,Si-O-Si bonds in a Si 3N 4.An analysis of Raman spectra of a Si 3N 4 for thermal treatment in various temperature and atmosphere are made.
出处
《中国粉体技术》
CAS
1999年第3期30-32,共3页
China Powder Science and Technology
关键词
非晶态氮化硅
纳米粒子
激光化学气相沉积法
amorphous Si 3N 4
nano partical
laser induced chemical vapor depostion method
