期刊文献+

WO3/Bi12SiO20光催化降解气相苯 被引量:8

Photocatalytic Degradation of Gas Phase Benzene over WO_3/Bi_(12)SiO_(20)
下载PDF
导出
摘要 用气液反应法和化学溶液分解技术(CSD)分别制备了WO3和Bi12SiO20粉末,并将二者耦合,合成出WO3/Bi12SiO20复合光催化剂.以气相苯的降解为探针反应,考查了催化剂的光催化活性.结果表明:耦合后的WO3/Bi12SiO20催化剂的催化活性显著提高,其中30%(w)WO3/Bi12SiO20在紫外光下对苯的降解率明显优于P-25,而且催化剂具有一定的可见光响应能力.采用X射线衍射(XRD)、扫描电子显微镜(SEM)、X射线光电子能谱(XPS)、N2吸附-脱附(BET)和紫外-可见漫反射(UV-VisDRS)等手段对催化剂进行了表征.结果表明:WO3与Bi12SiO20之间存在良好的能带协同作用.WO3与Bi12SiO20耦合后,催化剂的光响应范围拓宽,光生电子和空穴能有效地分离,光生电子和空穴产生速率增大,所以催化剂活性提高. WO3 and Bi12SiO20 powders were prepared by a gas-liquid reaction and chemical solution decomposition, respectively. WO3/Bi12SiO20 photocatalysts were coupled by mixing WO3 and Bi12SiO20. The reduction of benzene was used to investigate the activity of WO3/Bi12SiO20. The results indicate that the activity of the coupled WO3/Bi12SiO20 catalysts increased substantially. The degradation behavior of benzene over 30%(w) WO3/Bi12SiO20 under UV irradiation was obviously better than that of P-25, and the degradation of benzene under visible light was also considerable. The photocatalysts were characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM), X-ray photoelectron spectroscopy (XPS) and UV-Vis diffuse reflectance spectroscopy (UV-Vis DRS). The results showed that there was a good synergistic effect between WO3 and Bi12SiO20. The photogenerated electrons and holes were effectively separated after coupling between WO3 and Bi12SiO20 and the rate of electron and hole production increased. The electrons and holes were effectively separated and the photocatalytic activity increased accordingly.
出处 《物理化学学报》 SCIE CAS CSCD 北大核心 2010年第12期3299-3304,共6页 Acta Physico-Chimica Sinica
基金 贵州省教育厅自然科学基金(2005221)资助项目~~
关键词 耦合 光催化 降解 气相苯 Coupling Photocatalysis Degradation Gas benzene
  • 相关文献

参考文献21

  • 1Fujishima,A.;Honda,K.Nature,1972,37(1):238.
  • 2Olis,D.F.;Pelizzetti,E.;Serpone,N.Environ.Soc.Technol.,1991,25(9):15229.
  • 3石金娥,闫吉昌,尚淑霞,陈大伟,王悦宏,闫福成,薛静,初丽伟,苏丽敏.二氧化钛纳米粒子和纳米管的合成、表征及对硝基苯的光催化性能研究[J].高等学校化学学报,2007,28(7):1325-1328. 被引量:23
  • 4Choi,W.;Terrain,A.;Hoffmann,M.R.J.Phys.Chem.,1991,95(13):5261.
  • 5Asahi,R.;Morikawa,T.;Ohwaki,T.;Aoki,T.;Taga,Y.Science,2001,293(5528):269.
  • 6Joshi,M.M.;Labhsetwar,N.K.;Mangrulkar,P.A.;Tijare,S.N.;Kamble,S.P.;Rayalu,S.S.Appl.Catal.A-Gen.,2009,357:26.
  • 7Gopidas,K.R.;Bohorquez,M.;Kamat,P.V.J.Phys.Chem.,1990,94(24):6435.
  • 8Tang,J.W.;Ye,J.H.Chem.Phys.Lett.,2005,410:104.
  • 9He,C.H.;Gu,M.Y.Scripta Mater.,2006,55:481.
  • 10He,C.H.;Gu,M.Y.Scripta Mater.,2006,54:1221.

二级参考文献42

共引文献42

同被引文献475

引证文献8

二级引证文献97

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部