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Criteria for versatile GaN MOVPE tool:high growth rate GaN by atmospheric pressure growth

Criteria for versatile GaN MOVPE tool:high growth rate GaN by atmospheric pressure growth
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摘要 Growth rate has a direct impact on the productivity of nitride LED production. Atmospheric pressure growth of GaN with a growth rate as high as 10/zm/h and also Alo.lGao.gN growth of 1μm/h by using 4 inch by 11 production scale MOVPE are described. XRD of (002) and (102) direction was 200 arcsec and 250 arcsec, respectively. Impact of the growth rate on productivity is discussed. Growth rate has a direct impact on the productivity of nitride LED production. Atmospheric pressure growth of GaN with a growth rate as high as 10/zm/h and also Alo.lGao.gN growth of 1μm/h by using 4 inch by 11 production scale MOVPE are described. XRD of (002) and (102) direction was 200 arcsec and 250 arcsec, respectively. Impact of the growth rate on productivity is discussed.
出处 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2011年第1期21-23,共3页 半导体学报(英文版)
关键词 MOVPE GaN: AlGaN atmospheric pressure growth high growth rate MOVPE GaN: AlGaN atmospheric pressure growth high growth rate
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参考文献5

  • 1Iida D, Nagata K, Makino T, et al. Growth of GalnN by raisedpressure metalorganic vapor phase epitaxy. Appl Phys Express, 2010, 3:075601.
  • 2Kim M H, Schubert M F, Dai Q, et al. Origin of efficiency droop in GaN-based light-emitting diodes. Appl Phys Lett, 2007, 91: 183507.
  • 3Fukuda Y, Orita T, Akutsu N, et al. Ex situ dry cleaning of reactor component of nitride metal organic chemical vapor deposition using chlorinated gases. J Cryst Growth, 2007, 298:433.
  • 4Tokunaga H, Fukuda Y, Ubukata A, et al. Multiwafer atmospheric-pressure MOVPE reactor for nitride semiconductors and ex-situ dry cleaning of reactor components using chlorine gas for stable operation. Phys Status Solidi C, 2008, 5:3017.
  • 5Matsumoto K, Tokunaga H, Ubukata A, et al. High growth rate metal organic vapor phase epitaxy GaN. J Cryst Growth, 2008, 310:3950.

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