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微水射流导引激光打孔的传热分析 被引量:7

ANALYSES OF HEAT TRANSFER IN MICRO-WATERJET GUIDED LASER DRILLING PROCESS
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摘要 微水射流导引激光加工是一种热影响区小,具有高加工精度的新型技术。本文基于有限体积法建立了微水射流导引激光束对硅片打孔过程的传热模型,将打孔过程分为三个阶段模拟其间的热量传递、相变过程和相边界的移动;探索了微水射流导引双脉冲激光打孔过程,进行了双脉冲不同延迟时间下的传热过程的数值模拟,得到了最佳延迟时间。结果表明:在初始加热阶段,高温区出现在表面以下区域;微水射流有强冷却作用并明显减小了热影响区;双脉冲激光的应用可以有效提高打孔的效率。 Micro-waterjet guided laser processing is an advanced technique with the advantages of narrow heat affect zone and high precision.A heat transfer model and simulations based on the finite volume method(FVM) for micro-waterjet guided laser drilling silicon wafer are presented in this study.The whole drilling process is treated as three stages with heat transfer,phase changes and moving boundary simulated and analyzed in details.The dual-pulse laser guided by micro-waterjet for the drilling process is proposed and explored.From heat transfer analyses and numerical simulations, the higher processing efficiency is obtained with the optimal dual-pulse laser delay time.The results illustrate that during the initial heating stage a high-temperature region exists just below the surface, the high cooling effect performed by waterjet reduces heat affect zone,and the drilling efficiency can be enhanced by the adopt of dual-pulse laser.
出处 《工程热物理学报》 EI CAS CSCD 北大核心 2011年第1期111-114,共4页 Journal of Engineering Thermophysics
基金 国家自然科学基金项目(No.10672069) 教育部留学回国人员科研启动基金 江苏省重点实验室开放基金项目
关键词 微水射流导引激光 传热 硅片 双脉冲激光 打孔过程 micro-waterjet guided laser heat transfer silicon wafer dual-pulse laser drilling process
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参考文献6

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同被引文献45

  • 1郭东明,刘战强,蔡光起,康仁科,董,申,李圣怡,赵万生,王振龙,贾振元,肖荣诗,朱荻.中国先进加工制造工艺与装备技术中的关键科学问题[J].数字制造科学,2005(4). 被引量:12
  • 2周永恒,廖健宏,蒙红云,刘颂豪.血管内支架的激光精细切割技术[J].应用激光,2005,25(3):161-164. 被引量:8
  • 3龙芋宏,熊良才,史铁林.水辅助准分子激光微加工硅的实验研究[J].激光技术,2006,30(6):567-569. 被引量:11
  • 4Richerzhagen B. Water-guided laser processing[J]. Ind Laser Rev, 1997, 8- 10.
  • 5Laser-Microjet - a new method for material processing[R]. SYNOVA Report, Lausanne, Switzerland, 1998.
  • 6Li C F, Johnson D B, Kovacevic R. Modeling of waterjet guided laser grooving of silicon [J]. Int J Machine Tools & Manufacture, 2003, 43 : 925 - 936.
  • 7Li C F, Johnson D B, Kovacevic R. Modeling of heat transfer in waterjet guided laser driling of silicon[J]. Proceedings of the Institution of Mechanical Engineers part B-Journal of Engineering Manufacture, 2003, 217:583- 600.
  • 8Wang Y, Li L, Yang L J, Liu B, Wang Z. Simulation and experimental research on water-jet guided laser cutting silicon wafer[A]. Proceedings of International Conference on Electronic Packaging Technology and High Density Packaging[C]. Shanghai, 2008, IEEE, New York, 826- 831.
  • 9Kray D, Hopman S, Spiegel A. Study on the edge isolation of industrial silicon solar cells with waterjet-guided laser[J]. Solar Energy Material and Solar Cells, 2007, 91:1638- 1644.
  • 10Voller V R, Prakash C. A fixed-grid numerical modeling methodology for convection-diffusion mushy region phase-change problems[J]. Int J Heat Mass Transfer, 1987, 30,1709- 1720.

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