摘要
本文推导了光折变晶体角度编码多重全息存储中写入均匀光栅时的曝光时间递推公式．分析了散射效应对光栅写入时间常数的影响和写入光耦合对光栅振幅的影响，给出了两种因素影响下曝光时间计算的修正递推公式．数值计算结果表明，按照这种修正公式计算所得多重存储中各幅全息光栅振幅不仅均匀性好，而且振幅相对较大，这种曝光方法有利于提高晶体的存储容量．实验中以递推公式所得时间进行曝光记录，在厚度为０．
It is given the formulas to calculate the exposure time in
recording uniform multiple holograms in this paper.The influence of scattering effects on the
time constant of photorefractive crystal has been analyzed and so does the influence of light
beam couple on grating amplitude.The formulas have been modified by these two
influences.The calculated results have shown that the uniform holograms and great holographic
grating can be obtained in this exposure schedule.In experiment,we have easily stored thirty
uniform superimposed holograms in Fe∶LiNbO 3 crystal of thickness 0.6mm in the exposure
schedule by using angular multiplexing.
出处
《光子学报》
EI
CAS
CSCD
1999年第7期641-646,共6页
Acta Photonica Sinica
基金
国家自然科学基金
关键词
时间递减
全息存储
扁形效应
光折变晶体
Schedule in decreasing time by
degrees
Storage of multiple holograms
Fanning effects
Beams couple
