摘要
用电弧离子镀设备在一端封口的Φ50 mm×200 mm×5 mm不锈钢深管内壁上沉积TiN薄膜,镀膜前在管子上方布置一个0.4 T的永磁体,以考察附加磁场对深管内壁沉积TiN薄膜的影响。对薄膜的厚度、表面形貌、相结构、显微硬度等随管子深度的变化进行了分析与测试,结果表明,薄膜的厚度及显微硬度都随管子的深度而下降,但在距管开口处前120 mm范围内下降明显慢于未加磁场的,说明磁场对内孔沉积具有促进作用;按照显微硬度不低于20 GPa划分,本实验的镀膜深径比达到了2.0,比未加磁场时提高了40%。
A novel technique was developed to deposit TiN films by arc ion plating on the inner walls far away from the opening of the one-end-closed stainless steel tube（Ф50 mm×200 mm×5 mm）.In the technique a permanent magnet was suspended 20 mm above the optimized position of the tube,i.e.,50 mm to the right of the center of the tube.The impact of the magnetic field on the film growth was experimentally studied.The microstructures and mechanical properties were characterized with X-ray diffraction and scanning electron microscopy.The results show that the magnetic field significantly improves the film growth and its mechanical properties.For example,at 120 mm from the tube opening,the film thickness and surface hardness were found to decreases much slower than those in the control sample,indicating the strong impact of the magnetic field.Based on the hardness ≥20 GPa,the magnetic field can be considered to increase the deposition depth by 40% with a ratio of deposition depth and diameter up to 2.0.
出处
《真空科学与技术学报》
EI
CAS
CSCD
北大核心
2011年第1期71-75,共5页
Chinese Journal of Vacuum Science and Technology
关键词
电弧离子镀
磁场
管内壁
TIN薄膜
Arc ion plating
Magnetic filed
Internal wall of deep tube
TiN film
