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硅对低温胁迫下黄瓜幼苗生长的影响 被引量:13

Effects of silicon on growth of cucumber seedlings under low temperature stress
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摘要 采用砂基培养的方法,研究硅对低温胁迫下黄瓜幼苗生长的影响。结果表明加硅处理能使低温胁迫下的黄瓜幼苗超氧化物歧化酶(SOD)、过氧化物酶(POD)活性显著升高:丙二醛(MDA)含量和超氧阴离子自由基(O_2^-)产生速率显著下降,叶片质膜透性降低;硅提高了低温胁迫下黄瓜幼苗的可溶性蛋白质和叶绿素含量、叶绿素a/b比值及植株生物量。因此,硅可以减弱低温胁迫对黄瓜幼苗的伤害。 Effects of silicon on growth of cucumber seedlings under low temperature stress were studied through sand culture experiment. The results showed that, compared to the cucumber seedlings grown without silicon addition under low temperature stress, the activities of superoxide dismutase (SOD), peroxidase(POD) in leaves and roots were significantly increased by silicon treatment. However, the content of malondialdehyde (MDA) and the producing rate of superoxide radical(0~) in silicon-treated seedlings were markedly decreased as compared to the control. The relative plasma membrane permeability reduced in silicon-treated seedlings. The content of protein, chlorophyll, chlorophyll a/b ratio and fresh weight of maize seedlings were also increased by silicon addition under low temperature stress. Thus, the damage by low temperature stress on cucumber seedlings could be alleviated by silicon addition.
出处 《生态科学》 CSCD 2011年第1期38-42,共5页 Ecological Science
基金 安徽省教育厅自然科学基金项目(2006KJ191B)资助
关键词 低温胁迫 黄瓜幼苗 膜脂过氧化 保护酶 silicon low temperature stress cucumber seedlings membrane lipid peroxidation protective enzymes
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