摘要
采用射频磁控溅射法在Si(111)基片上沉积了MnZn铁氧体薄膜,用X射线衍射仪(XRD)分析薄膜的物相结构,用振动样品磁强计(VSM)测量薄膜面内饱和磁化强度Ms和矫顽力Hc。结果表明:随着退火温度的升高,MnZn铁氧体薄膜的X射线衍射峰强度逐渐增强,且主峰逐渐由(311)峰变为(222)峰,沿(111)面取向生长明显。薄膜的饱和磁化强度和矫顽力均随着退火温度的升高而升高。
MnZn ferrite films were deposited on Si（111）substrate by RF magnetron sputtering.The phase structure was characterized by using X-ray diffractometer（XRD）.The in-plane saturation magnetization Ms and coercive force Hc of MnZn ferrite films were measured by vibrating sample magnetometer（VSM）.The results showed that as the annealing temperature increased,the intensity of X-ray diffraction peaks enhanced.Simultaneously,the main peak（311）shifted to（222）peak gradually,and the films grew along the（111）plane orientation significantly.Both saturation magnetization and coercive force increased with increasing annealing temperature.
出处
《实验科学与技术》
2011年第2期22-25,共4页
Experiment Science and Technology
