摘要
采用射频磁控溅射技术在玻璃衬底上制备ZnO薄膜。利用X射线衍射仪、原子力显微镜,分析了ZnO薄膜的晶体结构和表面形貌。结果表明:所制备的ZnO薄膜是具有(002)晶面择优生长的多晶薄膜。溅射气压为0.3Pa时,薄膜的晶粒尺寸较大,结晶度提高。
ZnO films are deposited on glass substrates by RF magnetron sputtering technology. The crystal structure and surface morphology of ZnO films are analysed by using X- ray diffraction （XRD） atom force microscope（AFM）. The result shows that all the deposited films are polyerystalline, growing preferentially in the （002）crystallographic direction. When the sputtering pressure is 0.3Pa , the grain size of ZnO films is larger, and the crystallinity increases.
出处
《渤海大学学报（自然科学版）》
CAS
2011年第1期31-33,共3页
Journal of Bohai University:Natural Science Edition
基金
辽宁省教育厅高等学校科研项目计划(No:120100003)
关键词
射频磁控溅射
ZNO薄膜
溅射气压
RF magnetron sputtering
ZnO films
sputtering pressure
