摘要
The optical embedded diffraction gratings with the internal refractive index modification in BK-7 glass plates were demonstrated using low-density plasma formation excited by a high-intensity femtosecond （130 fs） Ti： sapphire laser （λp=790 rim）. The refractive index modifications with diameters ranging from 400 nm to 4 gm were photoinduced after plasma formation occurred upon irradiation with peak intensities of more than 1 ×10^13 W/cm2. The graded refractive index profile was fabricated to be a symmetric around the center of the point at which low-density plasma occurred. The maximum refractive index change （An） was estimated to be 1.5x10 2. Several optical embedded gratings in BK-7 glass plate were demonstrated with refractive index modification induced by the scanning of low-density plasma formation.
The optical embedded diffraction gratings with the internal refractive index modification in BK-7 glass plates were demonstrated using low-density plasma formation excited by a high-intensity femtosecond (130 fs) Ti: sapphire laser (λp=790 nm). The refractive index modifications with diameters ranging from 400 nm to 4 μm were photoinduced after plasma formation occurred upon irradiation with peak intensities of more than 1×1013 W/cm2. The graded refractive index profile was fabricated to be a symmetric around the center of the point at which low-density plasma occurred. The maximum refractive index change (Δn) was estimated to be 1.5×10-2. Several optical embedded gratings in BK-7 glass plate were demonstrated with refractive index modification induced by the scanning of low-density plasma formation.
基金
Projects(2010-0001-226, 2010-0008-277) supported by NCRC(National Core Research Center) Program through the National Research Foundation of Korea funded by the Ministry of Education, Science and Technology
