摘要
立方氮化硼（ｃ－ ＢＮ） 在机械、热、电子及光学方面有许多优异性能，因此世界上有很多研究人员从事ｃ－ ＢＮ 薄膜制备的研究，近年来薄膜沉积技术和ｃ－ ＢＮ 薄膜质量都已取得显著进步。介绍ｃ － ＢＮ 薄膜的用途、结构、制备方法及存在的问题。重点总结了控制ｃ－ ＢＮ 相形成的关键因素及ｃ－ ＢＮ 相形成机理。
Cubic boron nitride(c-BN)has a number of highly desired mechanical,thermal,electrical and optical properties.For this reason,there has been an extensive worldwide effort to synthesize thin films of c-BN.Recently there has been considerable progress in improving the deposition techniques and c-BN film quality.However unanswered question remains and process improvement is still needed.In this paper we introduce the useful applications of c-BN films and its microstructure,synthesis techniques,critically review the key experimental parameters controlling c-BN film formation and the mechanisms of c-BN formation.
出处
《真空与低温》
1999年第4期193-197,共5页
Vacuum and Cryogenics
