2Kumagai A,Ishibashi K,Ge Xu M.Tanaka H.Nogami O.Okada.HIgh-quality SiO2 film deposition using active reaction by oxygen radical[J].Vacuum,2002,66:317～322.
3Chrysicopoulou P,Davazoglou D,Trapalis C,Kordas G.Optical properties of SiO2-TiO2 sol-gel thin films[J].J of Materials Science,2004,39(8):2835～2839.
4Danson N,Hall G W,Howson R P.Improved control techniques for the reactive magnetron sputtering of silicon to produce silicon oxide and the implications for selected film properties[J].Thin Solid Films,1996,289:99～106.
5ZywitzkiU O,Sahm H,Krug M,Morgner H,Neumaon M.Comparison of structure and properties of SiOx coatings deposited by reactive pulsed magnetron sputtering (PMS) and by hollow cathode activated EB evaporation (HAD)[J].Surface and Coatings Technology,2000.133～134:555～560.
6Szczyrbowski J,Braner G,Teschner G,Zmelty A.Antireflective coatings on large scale substrates produced by reactive twinmagnetron sputtering[J].Journal of Non-Crystalline Solids,1997,218:2529.
7Ohsaki H,Tachibana Y,Shimizu J,Oyama T.High-rate deposition of SiO2 by modulated DC reactive sputtering in the transition mode without a feedback system[J].Thin Solid Films,1996,281～282:213～217.
8Song Y Z,Sakurai T,Maruta K,Matnsita A,Matsumoto S,Saisho S,Kikuchi K.Optical and structural properties of dense SiO2,Ta2O5and Nb2O5 thin-films deposited by indirectly reactive sputtering technique[J].Vacuum,2000,59:755-763.
9Reichling M,Bodemann A,Kaiser N.Defect induced laser damage in oxide multilayer coatings for 248nm[J].Thin Solid Films,1998,320:264～279.
10OBrien J,Kelly P J.Characterisation studies of the pulsed dual cathode magnetron sputtering process for oxide films[J].Surface and Coatings Technology,2001,142～144:621～627.
