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高分辨率投影光刻机光瞳整形技术 被引量:11

Pupil Shaping Techniques in High Resolution Projection Exposure Tools
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摘要 在高分辨光学光刻技术中,光瞳整形技术针对不同的掩模图形产生特定的光瞳光强分布模式,从而实现分辨力增强,获得更好的成像性能。概述了高分辨率投影光刻机照明系统中基于衍射光学元件(DOE)、微透镜阵列(MLA)和微反射镜阵列(MMA)的3种光瞳整形技术,并对这些技术的工作原理、设计制作方法和性能特点进行了归纳与总结。 In the high resolution optical lithography technology, illumination pupil shaping is employed to enhance the lithography resolution and achieve high imaging performance by using various illumination modes according to different mask structures. In this paper, three approaches of pupil shaping techniques based on diffractive optical element (DOE), micro lens array (MLA) and micro mirror array (MMA) are summarized. The principles, design and manufacturing methods are concluded.
出处 《激光与光电子学进展》 CSCD 北大核心 2011年第11期38-45,共8页 Laser & Optoelectronics Progress
基金 国家科技重大专项项目(2009ZX02205-001)资助课题
关键词 光学制造 光刻 离轴照明 光瞳整形 衍射光学元件 微透镜阵列 微反射镜阵列 optical fabrication lithography off-axis illumination pupil shaping diffractive optical element micro lens array micro mirror array
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参考文献42

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二级参考文献80

共引文献93

同被引文献90

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