摘要
研究了在高加速电压的电子束作用下，Ｃｒ－Ｃ、Ｎｉ－Ｐ非晶镀层结构的稳定性与其组分的关系，发现在远低于晶化温度的条件下，类金属元素含量越低，晶化程度越大。
The dependence of structure stability of electrodepositing amorphous Cr-C and Ni-P films on their components have been researched by action of high accelerated voltage electronic cluster. It was shown that, when temperature was far lower than crystalline temperature, the lower the content of submetallic element in films,the bigger the extent to crystallize.
出处
《北京科技大学学报》
EI
CAS
CSCD
北大核心
1996年第S2期64-68,共5页
Journal of University of Science and Technology Beijing
基金
国家自然科学基金
冶金部腐蚀-磨蚀与表面技术开放研究实验室资助
