期刊文献+

Dependence of wavDependence of wavefront errors on nonuniformity of thin films

Dependence of wavDependence of wavefront errors on nonuniformity of thin films
原文传递
导出
摘要 In contrast to uncoated substrate, a nonlinear relationship of phase shift with the thicknesses of the thin film makes the calculation of wavefront aberration complicated. A program is compiled to calculate the wavefront aberration of multilayer thin film produced by thickness nonuniformity. The physical thickness and the optical phase change on reflection are considered. As an example, the wavefront aberration of the all-dielectric mirror is presented in ArF excimer lithography system with a typical thickness distribution. In addition, the wavefront errors of the thin film at wavelengths of 193 and 633 nm are compared in the one-piece and two-piece arrangements. Results show that the phase shift upon reflection of the thin film produced by thickness nonuniformity is very sensitive to the incident angle, wavelength, and polarization. In contrast to uncoated substrate, a nonlinear relationship of phase shift with the thicknesses of the thin film makes the calculation of wavefront aberration complicated. A program is compiled to calculate the wavefront aberration of multilayer thin film produced by thickness nonuniformity. The physical thickness and the optical phase change on reflection are considered. As an example, the wavefront aberration of the all-dielectric mirror is presented in ArF excimer lithography system with a typical thickness distribution. In addition, the wavefront errors of the thin film at wavelengths of 193 and 633 nm are compared in the one-piece and two-piece arrangements. Results show that the phase shift upon reflection of the thin film produced by thickness nonuniformity is very sensitive to the incident angle, wavelength, and polarization.
出处 《Chinese Optics Letters》 SCIE EI CAS CSCD 2012年第1期82-85,共4页 中国光学快报(英文版)
基金 supported by the National Natural Science Foundation of China under Grant Nos.60878045 and 10976030
关键词 ABERRATIONS ERRORS Film preparation Phase shift Phase shifters Thin films WAVEFRONTS Aberrations Errors Film preparation Phase shift Phase shifters Thin films Wavefronts
  • 相关文献

参考文献9

  • 1W. Williams, "NIF large optics metrology software: description and algorithms", (Lawrence Livermore National Laboratory (LLNL), Livermore, CA, 2002).
  • 2J. R. Piascik, J. Y. Thompson, C. A. Bower, and B. R. Stoner, J. Vacuum Sci. & Technol. A 23, 1419 (2005).
  • 3M. Niibe, H. Nil, and Y. Sugie, Jpn. J. Appl. Phys. 41, 3069 (2002).
  • 4D. W. Reicher and S. A 104 (2000).
  • 5Q. Xiao, H. He, S. Shao Films 517, 4295 (2009).
  • 6McCormack, Proc. SPIE 4091, J. Sha, and Z. Fan, Thin Solid Y. Wang, Y. Zhang, W. Chen, W. Shen, X. Liu, and P Gu, Appl. Opt. 47, C319 (2008).
  • 7J. Ramsay and P. Ciddor, Appl. Opt. 6, 2003 (1967).
  • 8R. Knowlden, Proc. SPIE 288, 78 (1981).
  • 9H. A. Macleod, Thin-Film Optical Filters (3rd ed.) (Institute of Physics Pub., Philadelphia, 2001).

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部