摘要
阐述了2m激光干涉测长基准装置工作原理及系统组成，以线间距测量功能为基础，研究了接触式和非接触式的几何测长对准方法，实现了其测长功能拓展应用。介绍了实现纳米精度测长的技术措施。对称布局的双光电显微镜同步扫描测量接长的方式实现2m刻线间距测量，信号处理系统具有标准间距位置脉冲发生功能，可以实现位移传感器动态触发校准和其它应用。对于高质量的线纹尺，2m激光干涉测长基准装置单次测量刻线间距的最佳瞄准精度优于10nm（1σ），1m测量范围内的线纹测量不确定度U=（20＋40L）nm（k=2）。
The components and operation principle of 2m length measurement primary standard with laser interferometer is described. On the basis of the line space measurement, two localizing methods are studied for the multifunction applications of length measurement, the measures used to make sure nanometer accuracy are also described. Two opto-electronic microscopes symmetrically mounted are used for synchronously measuring;it can realize 2 m line space measurement with distance length extension between two microscopes. The system has the function of uniform position generating, so it can trigger displacement sensor for dynamic calibration and other applications. For measuring high quality of line scale ,the minimum standard deviation of localization of one measurement of the line with good shape may be less than 10nm,the expanded measurement uncertainty is U = （20 ＋40 L） nm （k =2）.
出处
《计量学报》
CSCD
北大核心
2012年第3期193-197,共5页
Acta Metrologica Sinica
关键词
计量学
干涉测长基准
长度量值溯源
多功能测长
双光电显微镜
Metrology
Interference length measurement primary standard
Length quantity tracing
Multi-function length measurement
Double optoelectronics microscope
