摘要
为解决精密球体在研磨过程中的研磨轨迹无法测量等问题,将MEMS陀螺仪测量角速度技术应用到球体研磨轨迹的测量中,研究并实现了一种基于MEMS三轴陀螺仪和STM32微控制器的轨迹测量系统。介绍了ITG3200三轴陀螺仪的特点、原理以及轨迹测量系统方案设计;分析了温度影响陀螺仪零偏的机理,基于最小二乘法原理,建立了零偏补偿模型,有效地提高零偏稳定性,满足了工程需要。进行轨迹测量系统的双自转研磨实验,结果表明:双自转研磨方式研磨均匀性较好。
In order to solve the problem of the lapping trace can＇t be measured on the ball,MEMS gyro is applied,a trace measurement system based on 3-axis MEMS gyro and micro-controller STM32 is proposed.The principle of the ITG3200 and the trace measurement system scheme is introduced.The influence of temperature variation on the zero-offset of silicon micromachined gyro is analyzed.A compensation model is constructed based on least square method,zero-offset stability is significantly enhanced.The dual rotation lapping experiment is carried out.The experimental results show that the lapping uniformity of dual rotation lapping can be evently distributed on the ball.
出处
《传感器与微系统》
CSCD
北大核心
2012年第5期79-81,87,共4页
Transducer and Microsystem Technologies
