摘要
利用磁控溅射的方法,在玻璃基片上制备了以不同厚度Bi作底层的FePt薄膜,然后经不同温度真空热处理,得到L10有序结构的FePt薄膜;同时,系统地研究了退火时间以及Bi底层的厚度对FePt薄膜的磁性能和微结构的影响。实验结果表明:利用Bi作底层,通过Bi原子在薄膜中的扩散作用可以有效地调控FePt薄膜的有序化程度,从而对薄膜的矫顽力进行控制;更重要的是,利用上述Bi原子对FePt原子有序化的调控作用,可以实现FePt原子的快速有序化,制备出能够快速有序的L10-FePt薄膜。
A series of Bi/FePt films with different Bi thickness were prepared by magnetron sputtering.The L10-FePt films were obtained after the as-deposited samples were subjected to vacuum annealing at various time.Effects of the Bi thickness and the annealing time on magnetic properties and crystal microstructure of FePt films were systematically studied.Experimental results showed that the ordering degree of the FePt film could be manipulated by adjusting diffusion of Bi atoms.FePt films with fast atomic ordering were constructed by using the manipulation of Bi atoms.
出处
《稀有金属》
EI
CAS
CSCD
北大核心
2012年第3期419-422,共4页
Chinese Journal of Rare Metals
基金
国家自然科学基金项目(50901007
11174020)
北京市自然科学基金(2102014)
清华大学先进成形制造教育部重点基金资助项目(2010001)
博士后特别资助基金项目(201003049)资助
中央高校基本科研业务费专项基金资助(FRF-TP-12-033A)
