摘要
氧化镁(MgO)薄膜作为等离子体显示器(PDP)的介质保护膜,其结构对于显示器的工作特性有重要影响。本文研究了MgO薄膜在制备过程中工艺条件对薄膜结构的影响。结果表明:MgO薄膜有(111)晶面的择优取向;基底温度越低或沉积速率越低,择优取向越明显;薄膜厚度或退火温度增加,各衍射强度增强;
As an insulting and protective layer,MgO films play a important role for operating characteristics of plasma display panel.The paper has shown the effect of deposition parameters on structure of MgO films.The results demonstrate:MgO films prossess (111) preferred orientation;the lower substrate temperature or deposition rates,the more prominent (111)preferred orientation;the intensity of diffraction peaks increase as a function of film thickness or annealing temperature,and (111) preferred orientation remains.
出处
《真空电子技术》
2000年第1期56-60,共5页
Vacuum Electronics
关键词
薄膜结构
工艺参数
氧化镁薄膜
MgO films
Structure of film
Preferred orientation
deposition parameters
