摘要
采用磁控反应溅射工艺制备了Si3N4/TiN陶瓷纳米多层膜,运用X射线衍射、透射电镜和显微硬度仪等对纳米多层膜的微结构、应力状态和硬度进行测试.研究结果表明,Si3N4/TiN多层膜中,Si3N4层为非晶态,TiN层为晶态.Si3N4/TiN多层膜的显微硬度既受调制周期Λ的影响,同时又与调制比有关.当调制比lSi3N4/lTiN=3和调制周期Λ=12.0nm左右时,多层膜的显微硬度达到最大值,其数值比用混合法则计算的值高40%以上.根据实验结果。
The polycrystalline Si 3N 4/TiN ceramic nano multilayer films were synthesized by a reactive magnetron sputtering technique. The microstructure, microhardness and internal stress state of the nano multilayer films were investigated using transmission electron microscope (TEM), microhardness tester and X ray diffraction (XRD). The results show that the Si 3N 4 layers are amorphous structure and the TiN layers are crystal in the Si 3N 4/TiN nano multilayer films. The hardness of Si 3N 4/TiN nano multilayers is affected not only by modulation period, but also by modulation ratio. The hardness reaches its maximum value when modulation period equals a critical value Λ 0, which is about 12 nm with a modulation ratio of 3/1 . The maximum hardness value is about 40% higher than the value calculated from the rule of mixtures. Based on the experimental results, the mechanism of the superhardness in this system was proposed.
出处
《上海交通大学学报》
EI
CAS
CSCD
北大核心
2000年第3期347-350,共4页
Journal of Shanghai Jiaotong University
关键词
纳米多层膜
氮化硅
超硬效应
氮化钛
陶瓷膜
Si_3N_4/TiN
nano multilayer films
microhardness
microstructures
