摘要
使用Murakami溶液和王水预处理高钴硬质合金刀片,并用直流磁控溅射(DCS)技术在此硬质合金上溅射铝过渡层,在热丝化学气相沉积(HFCVD)设备里沉积金刚石薄膜;分析了金刚石形核机理,并利用SEM以及Raman等方法表征试样。结果表明:与未溅射过渡层的样品相比,在过渡层上的金刚石形核密度更高,金刚石颗粒尺寸更加细小。
The WC-10%Co cutting tool material is pre-treated by Murakami solution and aqua regia; then aluminum(Al) is sputtered on the hard-metal by direct current magnetron sputtering (DCS) technology. Diamond thin films are deposited on the cemented car- bide by hot filament chemical vapor deposition (HFCVD) process. The diamond nucleation mechanism on the hard-metal is ana- lyzed. The results show that as compared with uncoated Al interlayer sample, its diamond nucleation density is higher and the dia- mond grain size is smaller.
出处
《机械制造与自动化》
2012年第3期27-29,42,共4页
Machine Building & Automation
基金
国家自然科学基金(No.51005117)
国家自然科学基金(No.51075211)
南京航空航天大学2010年度研究生创新基金