摘要
本文介绍了 JGP- 4 2 0型超高真空射频磁控溅射镀膜机的设计思想和研制过程 ,并讨论了在该机上进行硅片上沉积 Pt和 Si O2 膜层的实验情况。
The design idea and research process of the ultra high vacuum RF magnetic sputtering plant, JGP 420 is introdnced in this paper. And also give the experiment status of Pt and SiO 2 film deposition on Si plate. Here provide certain reference to develop this kind of plant and their process.
出处
《真空》
CAS
北大核心
2000年第3期23-28,共6页
Vacuum
