摘要
用磁控溅射法制备了NiFe/Ag多层膜 ,并从实用角度对NiFe/Ag多层膜的低场巨磁电阻效应作了研究。分析了该膜系列产生低场巨磁电阻效应的机理 ,并进行了实验研究 ,最终获得在低场 (小于 79 6× 2 5 0A/m)常温下有高达 5 0
NiFe/Ag multilayer was grown by magnetron sputtering.Giant magneto resistance (GMR) of the film was observed in a low magnetic field.Its mechanism was tentatively discussed.A new multilayer of NiFe/Ag has been successfully developed with the maximum GMR ratio of 50%,at a field of 0～79 6×250 A/m at room temperature.
出处
《真空科学与技术》
CSCD
北大核心
2000年第3期173-175,共3页
Vacuum Science and Technology
