摘要
PhilipsMRD3710X射线衍射仪由于其灵敏度高、可靠性好、操作方便 ,常常用于薄膜测试分析。采用X射线衍射仪对在 (10 0 )Si表面溅射Pt,并通过退火处理形成的Pt和Si的化合物进行了测试分析 ,从而对PtSi膜的研制提供了可靠的数据。
Philips MRD X-ray diffractometer used in our experiment has very high sensitivity,reliability and resolution.Measurement and analysis are made using MRD diffractometer on Pt sputtered on Si(100)surface,and Pt and Si compounds formed after annealing.Measurement results of PtSi flims by MRD are given.
出处
《半导体光电》
CAS
CSCD
北大核心
2000年第A03期87-88,共2页
Semiconductor Optoelectronics
关键词
X射线衍射仪
PTSI
薄膜
测试
X-ray diffractometer
PtSi
diffraction peak
thin film
