摘要
基于硫醇-烯类材料具有固化凝胶点滞后的特点,本文将多种硫醇-烯类材料应用于紫外压印的连续浮雕结构微光学元件复制加工工艺中,用以降低固化收缩对于加工误差的影响。实验结果表明,虽然该材料的固化收缩达到13%,但加工结果的收缩误差优于2%。反应离子刻蚀实验表明,通过调节刻蚀气体含量,该材料可实现连续浮雕结构的等比例图形传递。研究结果表明,应用基于硫醇-烯材料的紫外压印工艺制作连续浮雕结构微光学元件是一种行之有效的方法。
The curing shrinkage is one of the most important problems in UV-embossing, which can bring much fabrication error. Thiol-ene polymer has a delayed gel point, so the shrinkage stress caused by curing can be relaxed easily, and the shrinkage error can be brought down. In this paper, we propose a method which fabricates micro optical elements with continuous relief through UV-embossing process based on thiol-ene resist in order to reduce the influence of curing shrinkage. It can be seen from the ex- periment results that the curing shrinkage of this material is about 13% ,but the fabrication error can be reduced to less than 2 %. And the reactive ion etching experiment results show that the continuous relief can be transferred into fused silica substrates with the equal etching ratio through the reactive ion etching by adjusting the parameters of the etching gas. So it is a proper method to fabricate micro optical elements with continuous relief through UV-embossing with thiol-ene resist.
出处
《光电子．激光》
EI
CAS
CSCD
北大核心
2012年第8期1513-1518,共6页
Journal of Optoelectronics·Laser
基金
国家自然科学基金(60978044,61008039)
教育部高校博士学科点专项科研基金(20102302110010)资助项目
关键词
微光学元件
紫外压印
硫醇-烯
固化收缩
反应离子刻蚀
micro optical elements
UV-embossing
thiol-ene
curing shrinkage~ reactive ion etching
