摘要
主要对目前国际上研究较多的几种透明导电薄膜,如金属膜、透明导电氧化物(TCO)薄膜(In2O3基、SnO2基、ZnO基及TiO2基薄膜)、p型材料及多层膜的性能、制备工艺、研究现状及最新进展进行了较为详细的阐述。介绍了一些较为特殊的透明导电薄膜材料。展望了透明导电薄膜未来的研究方向及发展前景。
The properties, preparing technique, research status and recent development of the transparent conducting films including metal film, transparent conducting oxide （TCO） film （doped with Ine03, SnO2, ZnO or TiO2）, p-type materials and multilayer films are reviewed in detail. Some special transparent conducting film materials are also introduced. Finally, the research direction and application prospect of the transparent conducting films are discussed.
出处
《激光与光电子学进展》
CSCD
北大核心
2012年第10期22-31,共10页
Laser & Optoelectronics Progress
基金
上海市人才资金(2009023)
上海市大学生创新活动计划(SH1110252155)资助课题
关键词
薄膜
透明导电薄膜
金属膜
透明导电氧化物薄膜
多层膜
thin films
transparent conducting film
metal film
transparent conducting oxide film
multilayer film
