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离子束刻蚀过程中台阶侧壁倾斜现象研究 被引量:2

study on step sidewall tilt in ion beam etching of Fresnel lens
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摘要 从标量衍射理论出发 ,在傅立叶光学的基础上 ,建立一个数学模型 ,分析台阶侧壁倾斜对多阶菲涅耳透镜衍射效率的影响。并通过实验 ,分析影响台阶侧壁倾斜、表面粗糙度和刻蚀速率的因素 ,确定离子束刻蚀菲涅耳透镜的最佳工艺参数。 Based on the theory of scalar diffraction and on the Fourier optics. a mathematical model is established. The effect of step sidewall tilt on diffractive efficiency of Fresnel lens is analyzed. In our experiment, the factor affecting step sidewall tilt, surface roughness and etching speed are analyzed. The optimal technical parameters of ion beam etching of Fresnel lens are confirmed.
出处 《微细加工技术》 2000年第2期28-33,共6页 Microfabrication Technology
关键词 离子束刻蚀 台阶侧壁倾斜 标量衍射 Ion beam etching Fresnel lens, step sidewall tilt diffractive efficiency
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