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化学刻蚀硅制备太阳能电池减反射结构的研究进展 被引量：1

Research Progress in Preparation of Antireflection Structure for Solar Cells by Chemical Etching
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摘要 硅基太阳能电池的关键技术之一是在硅表面制备高效减反射结构,化学刻蚀法是制备减反射结构的最常用方法,其研究热点为贵金属辅助化学刻蚀技术,综述了化学刻蚀硅制备太阳能电池减反射结构的主要方法、刻蚀机理、工艺特征及应用等的研究进展,重点介绍了贵金属辅助化学刻蚀技术的最新研究成果. The research of the silicon solar cells mainly focuses on reducing cost and improving conversion efficiency,and one of the effective methods of reducing the photoelectric conversion efficiency of the solar cells is to decrease the reflection of incident sunlight onto the light-receiving surface.Preparation antireflection structure is an important step in the preparation of silicon-based solar cell.Wet chemical etching is the most common method to produce antireflection structure due to its simple and low cost process.The latest progress in the preparation of antireflection structure via chemical etching silicon is reviewed,focusing on the main etching method,etching mechanism,process characteristics and applications.
作者 贺春林 杨雪飞 马国峰 王建明 才庆魁
机构地区 沈阳大学辽宁省先进材料制备技术重点实验室
出处 《沈阳大学学报（自然科学版）》 CAS 2012年第6期19-25,共7页 Journal of Shenyang University：Natural Science
基金 国家自然科学基金资助项目(51171118) 沈阳市科技基金资助项目(F10-205-1-60)
关键词 太阳能电池 减反射结构 硅 化学刻蚀 solar cell antireflection structure silicon chemical etching
分类号 TM914.41 [电气工程—电力电子与电力传动]
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参考文献33

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共引文献22

同被引文献30

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引证文献1

沈阳大学学报（自然科学版）
2012年 第6期

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