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SnO_2纳米线表面形貌影响因素研究

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摘要 采用化学气相沉积法在经硝酸镍水溶液处理过的硅衬底上,通过控制生长条件,制备出了二氧化锡的几种纳米结构。利用扫描电子显微镜(SEM)对样品的表面形貌进行了表征,并在此基础上对CVD过程中影响产物形貌的各因素进行了讨论分析,为实现SnO2纳米线的可控生长提供了工艺参数。
出处 《科技资讯》 2012年第33期80-81,共2页 Science & Technology Information
基金 重庆市教委项目基金(编号:kj121317)
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