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沉积温度对磁控溅射Ni_3Al-Cr薄膜微观结构及性能的影响 被引量:1

The influence of depositing temperature on structure,corrosion resistance and mechanical properties of magnetron sputtered Ni_3Al-Cr thin films
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摘要 通过磁控溅射分别在300、400、500和600℃下沉积了Ni3Al-Cr薄膜。采用X射线衍射(XRD)和原子力显微镜(AFM)表征了薄膜的晶体结构和表面形貌,通过方阻法检测了薄膜的抗腐蚀性能,采用纳米压痕表征了薄膜的硬度。结果表明,沉积温度对薄膜的微观结构、抗腐蚀及力学性能有重要影响。随着沉积温度的升高,薄膜晶粒及颗粒尺寸增大,300℃时形成尺寸均匀的立方体小颗粒,400和500℃时颗粒长大且致密堆积,600℃时部分颗粒过度长大。在400℃沉积的薄膜兼具最优的抗腐蚀性和力学性能。证明了方阻法表征薄膜抗腐蚀性能的可靠性。 Ni3Al-Cr thin films were deposited at 300,400,500 and 600℃ by magnetron sputtering.X-ray diffraction(XRD) and atomic force microscope were used to analysis the microstructure,and the surface morphology.The method that adopting four probe to measure the sheet resistance change during corrosion was used to analysis the corrosion resistance of the thin films.The hardness was measured by a nano indenter.The results demonstrated that the depositing temperature has much influence on microstructure,corrosion resistance,and mechanical properties.As depositing temperature increased,the crystalline size and particle size increased.Dense spherical particles were formed at 400 and 500℃.Unconsolidated cubic particles were formed at 300℃.Part particles grew excessively at 600℃.The thin film deposited at 400℃ had the best corrosion resistance and mechanical properties.Besides this,this study proved the sheet resistance method to be reliable to analysis the corrosion resistance.
出处 《功能材料》 EI CAS CSCD 北大核心 2013年第4期483-487,共5页 Journal of Functional Materials
基金 国家高技术研究发展计划(863计划)重点资助项目(2009AA035002) 四川省非金属复合与功能材料重点实验室开放基金资助项目(11zxfk17) 西南科技大学研究生创新基金资助项目(12ycjj07)
关键词 薄膜 磁控溅射 微观结构 抗腐蚀性能 力学性能 thin film magnetron sputtering microstructure corrosion resistance mechanical properties
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