摘要
Electric potential near a wall for plasma with the surface produced negative ions with magnetic field increasing toward a wall is investigated analytically.The potential profile is derived analytically by using a plasma-sheath equation,where negative ions produced on the plasma grid (PG) surface are considered in addition to positive ions and electrons.The potential profile depends on the amount and the temperature of the surface produced negative ions and the profile of the magnetic field.The negative potential peak is formed in the sheath region near the PG surface for the case of strong surface production of negative ions or low temperature negative ions.As the increase rate of the magnetic field near the wall becomes large,the negative potential peak becomes small.
Electric potential near a wall for plasma with the surface produced negative ions with magnetic field increasing toward a wall is investigated analytically. The potential profile is derived analytically by using a plasma-sheath equation, where negative ions produced on the plasma grid （PG） surface are considered in addition to positive ions and electrons. The potential profile depends on the amount and the temperature of the surface produced negative ions and the profile of the magnetic field. The negative potential peak is formed in the sheath region near the PG surface for the case of strong surface production of negative ions or low temperature negative ions. As the increase rate of the magnetic field near the wall becomes large, the negative potential peak becomes small.
关键词
表面电势
表面磁场
墙壁
生产
离子源
等离子体鞘
电势分布
负离子
negative ion source, surface produced negative ion, sheath potential, cusp magnetic field, electric potential, plasma-sheath equation, extraction region
